Plasma Enhanced Chemical Vapor Deposition (PECVD)

  1. Electronics Research Institute
  2. Nanotechnology Special Lab

Device information

  • Name: Plasma Enhanced Chemical Vapor Deposition (PECVD)
    Model: ***
    Num of units: 1
  • Manufacture Year:
    Manufacturer Website:
  • Description: PECVD is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate.
  • Availability: available
  • Services
    Cost
    -
    -

For more info and reservation contact:

  • Lab Person
  • ragia mohamed
  • 01008215914
  • University Coordinator
  • Electronics Research Institute
  • info@eri.sci.eg
  • 00226252700