Description: The system consists of sealed jar evacuated by rotary pump till vacuum level of 8×10-3 mbar. Nickel chrome heater is used to anneal the films on the holder inside the jar at temperature up to 650 °C. The temperature can be controlled by adjusting the power supply biasing voltage. K-type thermocouple is employed for temperature measurements. High vacuum pressure gauge is used for pressure measurements inside the jar. I-V measurement circuit is attached to the vacuum annealing setup for studying the variation of resistance in term of temperature.

Availability: available